Recent Progress in EUV Blanks Development

Recent Progress of EUV Resist Technology in EIDEC

EUV lithography is one of the promising technologies for manufacturing devices at 16 nm half-pitch node and below. EUV resists are required to improve the resolution, line width roughness (LWR), and sensitivity. However it is generally thought that the lithographic performance is determined by the trade-off relationship among these factors. Moreover, resist outgassing is another issue with EUV ...

Recent Progress in Allergen Immunotherapy

The efficacy of allergen immunotherapy for the treatment of allergic rhinoconjunctivitis with or without seasonal bronchial asthma and anaphylaxis caused by the sting of the hymenoptera class of insects has been clearly demonstrated in numerous well-designed, placebo-controlled trials. Immunotherapy whether by subcutaneous injection of allergen extract or by oral/sublingual routes modifies peri...

Recent Progress in Zeolite/Zeotype Membranes

This is a comprehensive review of the recent progresses made in the field of zeolite membranes. It describes zeolitic materials and methods of membrane fabrication, followed by a summary of applications for gas separation, pervaporation and separation of liquid mixtures. Special attention is called to polymer mixed matrix membranes (MMMs) and membranes based on metal organic frame works (MOFs)....

recent progress in allergen immunotherapy

the efficacy of allergen immunotherapy for the treatment of allergic rhinoconjunctivitis with or without seasonal bronchial asthma and anaphylaxis caused by the sting of the hymenoptera class of insects has been clearly demonstrated in numerous well-designed, placebo-controlled trials. immunotherapy whether by subcutaneous injection of allergen extract or by oral/sublingual routes modifies peri...

Auxetic nanomaterials: Recent progress and future development